Display Device and Manufacturing Method Thereof

ABSTRACT

Disclosed is a display device and a method of manufacturing the display device. The display device includes a pixel electrode disposed in an opening area; a common electrode having at least one region that overlaps the pixel electrode in the opening area; a gate line extending along a row direction in a non-opening area that surrounds the opening area; a data line extending along the non-opening area in a column direction that is perpendicular to the row direction; and a touch sensing line extending in the column direction across the opening area, wherein the opening area may have a shape in which a length of the opening area in the row direction is longer than a length of the opening area in the column direction.

CROSS-REFERENCE TO RELATED APPLICATION

The present application claims priority to Republic of Korea PatentApplication No. 10-2021-0193659, filed Dec. 31, 2021, which is herebyincorporated by reference in its entirety.

BACKGROUND Field

The present disclosure relates to a display device and a manufacturingmethod thereof.

Description of the Related Art

As information society develops, various types of display devices havebeen developed. Recently, various display devices, such as a liquidcrystal display (LCD), a plasma display panel (PDP), and an organiclight emitting display (OLED) have been used.

Recently, a touch screen capable of displaying an image and sensing auser’s touch has been widely used. The touch screen may have a structureof an add-on type, an on-cell type, and an in-cell type. Among them, thetouch screen having the in-cell type structure can reduce the thicknessand improve durability of the display device.

SUMMARY Technical Problem

The embodiments herein describe, with respect to the in-cell typestructure, a display device including a common electrode extending in ahorizontal direction and a manufacturing method of the same.

Also, the embodiments describe a display device in which a touch sensingline and a source-drain electrode are disposed on a same layer, and amanufacturing method of the same.

Technical Solution

A display device according to an embodiment of the present disclosurecomprises a pixel electrode disposed in an opening area; a commonelectrode having at least one region that overlaps the pixel electrodein the opening area; a gate line extending along a row direction in anon-opening area, the non-opening area surrounding the opening area; adata line extending along the non-opening area in a column directionthat is perpendicular to the row direction; and a touch sensing lineextending in the column direction across the opening area. The openingarea has a shape in which a length of the opening area in the rowdirection is longer than a length of the opening area in the columndirection

In one embodiment, a manufacturing method of a display device accordingto an embodiment of the present disclosure comprises: forming a lightblocking layer on a substrate using a first mask, the substrateincluding an opening area and a non-opening area that surrounds theopening area; forming an active layer on the light blocking layer usinga second mask; forming an active layer on the light blocking layer usinga second mask; forming an interlayer-insulating layer that covers thegate line; forming a first contact hole that exposes one region of theactive layer using a fourth mask; forming a data line that extends in acolumn direction that is perpendicular to the row direction in thenon-opening area, and a touch sensing line that extends in the columndirection across the opening area using a fifth mask; and forming apixel electrode in the opening area using a sixth mask, wherein theopening area has a shape in which a length of the opening area in therow direction is longer than a length of the opening area in the columndirection.

In one embodiment, a display device comprises: a plurality of pixelsincluding a pixel having an opening area in which an image is displayedand a non-opening area where the image is not displayed, the openingarea having a length in a first direction that is longer than a lengthof the opening area in a second direction that is different from thefirst direction; a plurality of gate lines connected to the plurality ofpixels, the plurality of gate lines including a gate line that extendsin the first direction in the non-opening area of the pixel; a pluralityof data lines connected to the plurality of pixels, the plurality ofdata lines including a data line that extends in the second direction inthe non-opening area of the pixel; a plurality of touch sensing linesincluding a touch sensing line that extends in the second directionacross the opening area of the pixel; wherein the pixel includes a pixelelectrode in the opening area of the pixel and a common electrode havinga portion that overlaps the pixel electrode in the opening area, theportion of the common electrode having a length in the first directionthat is longer than a length of the portion of the common electrode inthe second direction.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a block diagram illustrating a configuration of a displaydevice according to an embodiment of the present disclosure.

FIG. 2 is a plan view illustrating a structure of a touch sensingelectrode and a touch sensing line shown in FIG. 1 according to anembodiment of the present disclosure.

FIG. 3 is an enlarged plan view of area AA of FIG. 2 according to anembodiment of the present disclosure.

FIG. 4 is a cross-sectional view taken along line I-I′ of FIG. 3according to an embodiment of the present disclosure.

FIG. 5 is a cross-sectional view taken along line II-II′ of FIG. 3according to an embodiment of the present disclosure.

FIGS. 6 to 21 are cross-sectional views illustrating a manufacturingmethod of a display device according to an embodiment of the presentdisclosure.

FIG. 22 is an enlarged plan view of a region of a display deviceaccording to an embodiment of the present disclosure.

DETAILED DESCRIPTION

Hereinafter, embodiments of the present disclosure will be describedwith reference to drawings. In this specification, when a component (orregion, layer, part, etc.) is referred to as being “on”, “connected” to,or “joined” to another component, it means that the component can bedirectly connected/coupled to the other component or a third componentcan be arranged between them.

The same reference numbers refer to the same components. In addition, inthe drawings, the thickness, ratio, and dimension of the components areexaggerated for effective description of technical contents. An “and/or”includes one or more combinations capable of being defined by theassociated configurations.

Terms such as “first” and “second” may be used to describe variouscomponents, but the components are not limited by the terms. The termsare used only for the purpose of distinguishing one component from othercomponents. For example, the first component may be referred to as thesecond component without departing from a scope of right of the presentembodiments, and similarly, the second component may also be referred toas the first component. Singular expressions include plural expressionsunless the context clearly indicates otherwise.

Terms such as “below”, “lower”, “above”, “upper”, etc. are used todescribe the association of components shown in the figures. The termsare relative concepts and are explained based on the directionsindicated in the drawings.

It should be understood that terms such as “comprise” or “have”, etc.are intended to indicate that a feature, number, step, operation,component, part, or combination thereof is described in thespecification, and that the possibility of the presence or addition ofone or more of other features or numbers, steps, operations, components,parts, or these combinations thereof is not excluded in advance.

FIG. 1 is a block diagram illustrating a configuration of a displaydevice according to an embodiment of the present disclosure.

Referring to FIG. 1 , a display device 1 includes a timing controller10, a gate driver 20, a data driver 30, a touch driver 40, and a displaypanel 50.

The timing controller 10 may receive an image signal RGB and a controlsignal CS from the outside the display device (e.g., a host system). Theimage signal RGB may include a plurality of grayscale data. The controlsignal CS may include, for example, a horizontal synchronization signal,a vertical synchronization signal, and a main clock signal.

The timing controller 10 processes the image signal RGB and the controlsignal CS according to an operating condition of the display panel 50,and may generate and output an image data DATA, a gate driving controlsignal CONT1, a data driving control signal CONT2, and a touch drivingcontrol signal CONT3.

The gate driver 20 may be connected to pixels (or sub-pixels) PX of thedisplay panel 50 through a plurality of gate lines GL1 to GLn. The gatedriver 20 may generate gate signals on the basis of the gate drivingcontrol signal CONT1 output from the timing controller 10. The gatedriver 20 may provide the generated gate signals to the pixels PXthrough the plurality of gate lines GL1 to GLn.

The data driver 30 may be connected to pixels PX of the display panel 50through a plurality of data lines DL1 to DLm. The data driver 30 maygenerate data signals on the basis of the data driving control signalCONT2 and the image data DATA output from the timing controller 10. Thedata driver 30 may provide the generated data signals to the pixels PXthrough the plurality of data lines DL1 to DLm. The data signals may beapplied to the pixels PX of the pixel column selected by the gatesignal. To this end, the data driver 30 may supply data signals to theplurality of data lines DL1 to DLm to be synchronized with the gatesignal.

The touch driver 40 may be connected to pixels PX of the display panel50 through a plurality of sensing lines SL1 to SLm. The touch driver 40may generate a touch scan signal on the basis of the touch drivingcontrol signal CONT3 output from the timing controller 10 and providethe same to the pixels PX. The touch driver 40 may receive a touchsensing signal through a plurality of sensing lines SL1 to SLm anddetect a touch input on the basis of the received touch sensing signal.

A plurality of pixels PX are disposed on the display panel 50. Thepixels PX may be arranged in, for example, a matrix form on the displaypanel 50.

Each pixel PX may be electrically connected to corresponding gate lineand data line. The pixels PX may emit light with luminance correspondingto the gate signals and the data signals supplied through the gate linesGL1 to GLn and the data lines DL1 to DLm.

Each pixel PX may display any one of the first to third colors.According to an aspect, each pixel PX may display any one of red, green,and blue colors. According to another aspect, each pixel PX may displayany one of cyan, magenta, and yellow colors. In various embodiments, thepixels PX may be configured to display any one of four or more colors.For example, each pixel PX may display any one of red, green, blue, andwhite colors.

The display panel 50 may be configured in an in-cell touch type panelcapable of sensing a touch input. For example, the display panel 50 maybe configured to include a pixel electrode that is driven by receiving acommon voltage during a display period within one frame, and receiving atouch scan voltage during a touch detection period within one frame. Thecommon voltage for displaying an image during the display period and thetouch scan voltage for detecting a touch during the touch detectionperiod may be applied to a pixel electrode of pixels PX. The pixelelectrode may operate as a display driving electrode driving a liquidcrystal together with the common electrode during the display period,and may operate as a touch sensing electrode TE detecting a touchposition during the touch detection period. The touch sensing electrodemay be sequentially driven for one frame, but are not limited thereto.

The timing controller 10, the gate driver 20, the data driver 30, andthe touch driver 40 may be each configured as a separate integratedcircuit IC or may be configured as an integrated circuit in which atleast a portion thereof is integrated. For example, at least one of thedata driver 30 and the touch driver 40 may be integrated with the timingcontroller 10 to be configured as an integrated circuit.

In addition, although the gate driver 20 and the data driver 30 areshown as components separate from the display panel 50 in FIG. 1 , atleast one of the gate driver 20 and the data driver 30 may be configuredin an in-panel manner as to be formed integrally with the display panel50. For example, the gate driver 20 may be integrally formed with thedisplay panel 50 according to a gate in panel (GIP) manner.

FIG. 2 is a plan view illustrating a structure of a touch sensingelectrode and a touch sensing line shown in FIG. 1 according to oneembodiment.

Referring to FIG. 2 , the display panel 50 may include a plurality oftouch sensing electrodes TE. The touch sensing electrode TE may includeone or more common electrodes 320.

Each touch sensing electrode TE is connected to a corresponding touchsensing line SL. The touch sensing electrode TE and the touch sensingline SL may be connected to each other in a one to one relationship. Forexample, each touch sensing line SL may be connected to one commonelectrode 320 disposed in one touch sensing electrode TE.

A touch sensing line SL may transmit the common voltage to the touchsensing electrode TE connected to the touch sensing line SL during thedisplay period, and transmit the touch scan signal to the touch sensingelectrode TE during the touch sensing period. Also, the touch sensingline SL may sense a change in an electrical characteristic of the touchsensing electrode TE (e.g., a change in capacitance load), and output asan electrical signal.

The touch scan signal supplied through the touch sensing line SL may bea plurality of clock signals. When a user touches the display panel 50using a finger or an electronic pen, a capacitance is formed between thetouch sensing electrodes TE. A touch input may be detected. When a usertouches the display panel 50 using a finger or an electronic pen, acapacitance is formed between the touch sensing electrodes TE, and thetouch input may be detected by comparing the formed capacitance with thereference capacitance.

FIG. 3 is an enlarged plan view of area AA of FIG. 2 according to oneembodiment.

Each of the pixels PX includes an opening area OA in which an image isdisplayed by an electric field between a pixel electrode 310 and thecommon electrode 320, and a non-opening area NOA that has a drivingelement, for example, a thin film transistor 200, disposed for drivingthe common electrode 320 and the pixel electrode 310 of the opening areaOA and that surrounds the opening area. Here, the opening area OA may bea display area in which an image is displayed, and the non-opening areaNOA may be a non-display area in which an image is not displayed. Theopening area OA and the non-opening area NOA may be alternately disposedalong a row direction X. In the present embodiment, the opening area OAmay have a shape in which a length in the row direction X may be equalto or longer than a length in the column direction Y.

The common electrode 320 receives a common voltage during a displayperiod in one frame, and forms an electric field with the pixelelectrode 310. The common electrode 320 includes branch portions 321(e.g., protrusions) arranged side by side at equal intervals in thecolumn direction Y and a stem portion 322 (e.g., a connecting part)connecting the branch portions 321 to each other. By disposing thebranch portions 321 at equal intervals in the column direction Y, adistance between each pair of adjacent branch portions 321 is the same.The branch portions 321 may extend substantially in the row direction Xwithin the opening area OA, and the stem portions 322 may extend in thecolumn direction Y while connecting the branch portions 321 to eachother at both ends of the branch portions 321. Here, a length of thebranch portions 321 may be formed to be longer than a length of the stemportions 322. The common electrode 320 is generally formed in theopening area OA, and may be arranged in such a manner as to expand fromthe opening area OA to the non-opening area NOA.

The pixel electrode 310 may be widely formed in the opening area OA.When the opening area OA is formed in such a manner that a length in therow direction X that is longer than a length of the column direction Y,the pixel electrode 310 may have a generally rectangular shape in whicha length in the row direction X is longer than a length in the columndirection Y along the shape of the opening area OA.

The data line DL, the gate line GL, and the driving element such as thethin film transistor 200 may be disposed in the non-opening area NOA.

The data line DL extends along the column direction Y in the non-openingarea NOA disposed between the opening areas OA of adjacent pixelcolumns. The data line DL is connected to the pixel electrode 310, andmay transmit the data signal to the pixel electrode 310.

The gate line GL extends along the row direction X in the non-openingarea NOA disposed between the opening areas OA of adjacent pixel rows.

The touch sensing line SL crosses the opening area OA and extends alongthe column direction Y. The touch sensing line SL is disposed on thesame layer as the data lines DL disposed in the non-opening area NOA.The touch sensing line SL is formed in the column direction Y crossingthe opening area OA, and thus does not overlap the data lines DL. Here,the data lines DL and the touch sensing lines SL may be alternatelydisposed along the row direction X on the display panel 50.

The thin film transistor 200 includes a gate electrode 220 connected tothe gate line GL, a source electrode 230 connected to the data line DL,and a drain electrode 240 spaced apart from the source electrode 230.The drain electrode 240 of the thin film transistor 200 may be connectedto the pixel electrode 310 through a contact hole.

As illustrated, the pixel PX according to the present embodiment has ahorizontal electrode structure in that the opening area OA of the pixelPX extends substantially in the row direction X, and the branch portion321 of the common electrode 320 extends substantially in the rowdirection X.

Hereinafter, a detailed stack structure of the pixel structure abovewill be described in detail.

FIG. 4 is a cross-sectional view taken along line I-I′ of FIG. 3according to one embodiment, and FIG. 5 is a cross-sectional view takenalong line II-II′ of FIG. 3 according to one embodiment.

Referring to FIG. 3 together with FIGS. 4 and 5 , the display device 1according to an embodiment includes a substrate 100, circuit elementsdisposed on the substrate, and the common electrode 320 and the pixelelectrode 310 for displaying an image.

The substrate 100 may be a light transmitting substrate, as a basesubstrate of the display panel 50. The substrate 100 may be a rigidsubstrate including glass or tempered glass, or a flexible substratemade of plastic material. For example, the substrate 100 may be formedof a plastic material, such as polyimide, polyethylene terephthalate(PET), polyethylene naphthalate (PEN), polycarbonate (PC), and the like.However, the material of the substrate 100 is not limited thereto.

The opening area OA and the non-opening area NOA are formed on thesubstrate 100. The opening area OA may be defined as an area where animage is displayed according to an electric field between the pixelelectrode 310 and the common electrode 320. The non-opening area NOA maybe defined as an area in which a driving element for driving the pixelelectrode 310 of the opening area OA, for example, the thin filmtransistor 200 and wirings are disposed.

A light blocking layer 110 may be formed on the substrate 100. The lightblocking layer 110 is disposed to be overlapped with a semiconductorpattern of the thin film transistor 200 (e.g., channel regions (CH1,CH2) of an active layer 210 on a plane view), thereby protecting theoxide semiconductor device from external light.

A buffer layer 120 covers the light blocking layer 110. The buffer layer120 may prevent or at least reduce ions or impurities from beingdiffused from the substrate 100 and block or at least reduce moisturepenetration. In addition, the buffer layer 120 may improve surfaceflatness of the substrate 100. The buffer layer 120 may include aninorganic material such as oxide and nitride, an organic material, or anorganic-inorganic complex material, and may be formed in a single layeror multi-layer structure. For example, the buffer layer 120 may have astructure of three or more layers consisting of silicon oxide, siliconnitride, and silicon oxide.

The active layer 210 is formed on the buffer layer 120. The active layer210 may be formed of a silicon-based semiconductor material or anoxide-based semiconductor material. Amorphous silicon or polycrystallinesilicon may be used as the silicon-based semiconductor material. As theoxide-based semiconductor material, a quaternary metal oxide such asindium tin gallium zinc oxide (InSnGaZnO), ternary metal oxides such asindium gallium zinc oxide (InGaZnO), indium tin zinc oxide (InSnZnO),indium aluminum zinc oxide (InAlZnO), tin gallium zinc oxide (SnGaZnO),aluminum gallium zinc oxide (AlGaZnO), and tin aluminum zinc oxide(SnAlZnO), binary metal oxide such as indium zinc oxide (InZnO), tinzinc oxide (SnZnO), aluminum zinc oxide (AlZnO), zinc magnesium oxide(ZnMgO), tin magnesium oxide (SnMgO), indium magnesium oxide (InMgO),indium gallium oxide (InGaO), and indium oxide (InO), tin oxide (SnO),and zinc oxide (ZnO), and the like.

The active layer 210 may include a source region and a drain regioncontaining p-type or n-type impurities, and channel regions CH1 and CH2formed between the source region and the drain region. In an embodiment,at least two channel regions CH1 and CH2, which are mutually spaced, maybe formed between the source region and the drain region in the activelayer 210. In this case, the mutually spaced two channel regions CH1 andCH2 by the bent shape of the active layer 210 may be arranged side byside in the row direction X. However, the shape of the active layer 210is not limited thereto. For example, in another embodiment, one channelregion CH1 or CH2 may be formed in the active layer 210, and the activelayer 210 may be formed in a non-bent bar shape.

A gate insulating layer 130 may be formed on the active layer 210. Thegate insulating layer 130 may be silicon oxide (SiOx), silicon nitride(SiNx), or multiple layers thereof.

The first conductive layer is formed on the gate insulating layer 130.The first conductive layer may include the gate electrode 220. Also, thefirst conductive layer may further include the gate line GL. In anembodiment, the gate line GL is formed to substantially extend at oneside of the opening area OA along the row direction X.

Here, the gate electrode 220 may be disposed to be overlapped with thechannel region of the corresponding active layer 210. As illustrated,when the two channel regions CH1 and CH2 are formed on the active layer210, the gate electrode 220 is disposed to overlap the two channelregions CH1 and CH2 and may constitute the thin film transistor 200having a two-gate structure.

The gate electrode 220 may be integrally formed with the gate line GLelectrically connected to the gate electrode 220 to configure onepattern. For example, the gate electrode 220 may be a region overlappingthe channel regions CH1 and CH2 of the active layer 210 on the gate lineGL.

An interlayer-insulating layer 140 may cover the first conductive layer.The interlayer-insulating layer 140 may be silicon oxide (SiOx), siliconnitride (SiNx), or multiple layers thereof.

The second conductive layer is formed on the interlayer-insulating layer140. The second conductive layer may include the source electrode 230and the drain electrode 240. In addition, the second conductive layermay further include the data line DL. The source electrode 230 and thedrain electrode 240 may be connected to the source region and the drainregion of the active layer 210, respectively. According to anembodiment, at least one of the source electrode 230 and the drainelectrode 240 may be formed integrally with the data line DLelectrically connected, thereby forming one pattern. For example, thesource electrode 230 may be one region of the data line DL disposed onthe same layer.

In an embodiment, the data line DL extends along the column direction Yin the non-opening area NOA. In such embodiment, the source electrode230 and the drain electrode 240 are one region on the data line DLextending in the column direction (Y) or a region branching from theextended data line DL.

In the present embodiment, the second conductive layer may furtherinclude the touch sensing line SL. The touch sensing line SL crosses theopening area OA and extends along the column direction Y. The touchsensing line SL is disposed on the same layer as the data lines DL andis disposed in the non-opening area NOA. For example, the data lines DLand the touch sensing lines SL may be alternately disposed along the rowdirection X on the display panel 50.

In an embodiment, the data line DL and the touch sensing line SL may bedisposed to overlap each other on different layers. In such embodiment,a planarization layer or the like may be interposed between the dataline DL and the touch sensing line SL. The planarization layer may beprovided to alleviate a step difference in the underlying structure.

However, in the present embodiment, the data line DL and the sensingline SL are disposed on the same layer while being mutually spacedapart. In this case, the source-drain electrodes 230 and 240, the dataline DL, and the sensing line SL may be formed in a single process.Also, the process for forming the planarization layer is omitted sincethe data line DL and the sensing line SL are on the same layer due tobeing formed during the single process. As a result, a manufacturingprocess of the display device 1 according to the present embodiment canbe simplified and the number of masks required for the process can bereduced, and the production cost thereof can be reduced.

The second conductive layer may be covered by a first passivation layer150.

According to an embodiment, a third conductive layer may be formed onthe first passivation layer 150. The third conductive layer may include,for example, a dummy line. In an embodiment where the data line DL andthe touch sensing line SL are disposed on different layers to overlapeach other, the dummy line is disposed to be overlapped in at least aportion with the data line DL and the touch sensing line SL. The dummyline may be electrically floated during the driving period to distributenoise by the wirings and may reduce noise of the touch sensing signaldetected through the touch sensing line SL.

However, in the present embodiment, since the touch sensing line SL isspaced apart from the data line DL, noise by the other wirings isreduced. Accordingly, the dummy line is not required, and the process offorming the third conductive layer may be omitted. As a result, amanufacturing process of the display device 1 according to the presentembodiment can be simplified and the number of masks required for theprocess can reduced, and the production cost thereof can be reduced.

The pixel electrode 310 is formed on the first passivation layer 150.The pixel electrode 310 may be widely formed within the opening area OA.When the opening area OA is formed in such a manner that a length in therow direction X is longer than a length in the column direction Y, thepixel electrode 310 may have a generally rectangular shape in which alength in the row direction X is longer than a length in the columndirection Y along the shape of the opening area OA. Also, the pixelelectrode 310 may be disposed as to be overlapped in at least one regionwith the touch sensing line SL passing through the opening area OA.

The pixel electrode 310 may be covered by a second passivation layer160. The first and second passivation layers 150 and 160 may be asilicon oxide film (SiOx), a silicon nitride film (SiNx), or multiplelayers thereof, as insulating layers for protecting the coveredelements.

The common electrode 320 may be formed on the second passivation layer160. The common electrode 320 is generally formed in the opening areaOA, and may be arranged to extend from the opening area to thenon-opening area NOA. The common electrode 320 is electrically connectedto the touch sensing line SL through a contact hole.

In an embodiment, the common electrode 320 may include the branchportions 321 arranged side by side at equal intervals and the stemportion 322 connecting the branch portions 321 to each other. The branchportions 321 may extend substantially in the row direction X within theopening area OA, and the stem portions 322 may extend in the columndirection Y while connecting the branch portions 321 to each other atboth ends of the branch portions 321. Here, a length of the branchportions 321 may be formed to be longer than a length of the stemportions 322.

A cover substrate 400 may be disposed on the substrate 100. A colorfilter 410 may be formed on the cover substrate 400. The color filter410 may be disposed to overlap the opening area OA. The color filter 410is a wavelength-selective optical filter selectively transmitting only apartial wavelength band of incident light, in such a manner as totransmit light in a specific wavelength band and block light in anotherspecific wavelength band, and may be composed of a photosensitive resincontaining a colorant such as a pigment or dye. Light passing throughthe color filter 410 in the opening area OA may have any one of red,green, and blue colors. When the pixel PX displays a white color, thecolor filter 410 may be omitted for the pixel PX.

A black matrix 420 may be disposed between the color filters 410 of eachcolor. The black matrix 420 is disposed around the color filter 410between adjacent color filters 410 and may prevent light leakage andcolor mixing between the pixels PX of each color.

In an embodiment, the black matrix 420 is disposed to be overlapped inat least one region with the touch sensing line SL. Such black matrix420 has a pattern in which at least one region crosses the opening areaOA and extends along the column direction Y.

In an embodiment, a bump pattern may be formed on the common electrode320. The bump pattern is disposed to overlap the black matrix, so thatcolor mixing between adjacent pixels PX may be prevented. In the presentembodiment, the sensing line SL is disposed to overlap the black matrix420, so that the black matrix 420 of substantially double layers may beimplemented. Through the structure as such, in the present embodiment, adecrease in the aperture ratio of the pixel PX can be reduced, colormixing can be prevented or at least reduced, and an increase in thethickness of the black matrix can be prevented.

A light emission control means such as a liquid crystal layer may beincluded between the substrate 100 and the upper substrate 400.

Hereinafter, a manufacturing method of the display device 1 having thestructure as above will be described in detail.

FIGS. 6 to 21 are cross-sectional views illustrating a manufacturingmethod of a display device according to an embodiment of the presentdisclosure.

Referring to FIGS. 6 and 7 , the light blocking layer 110 may be formedon the substrate 100. The light blocking layer 110 may be generated byforming a conductive film on the substrate 100 through a printingprocess, a sputtering process, a chemical vapor deposition process, apulsed laser deposition (PLD) process, a vacuum deposition process, anatomic layer deposition process, or the like; and by performingpatterning through an etching process using a mask. Here, a first maskmay be used.

Referring to FIGS. 8 and 9 , thereafter, the buffer layer 120 may beformed on the light blocking layer 110. The buffer layer 120 may beformed through a chemical vapor deposition process, a spin coatingprocess, a plasma-enhanced chemical vapor deposition process, asputtering process, a vacuum deposition process, a high-densityplasma-chemical vapor deposition process, a printing process, or thelike.

The active layer 210 may be formed on the buffer layer 120. For example,an amorphous silicon layer may be formed on the buffer layer 120, andthe amorphous silicon layer may be crystallized to form a polysiliconlayer. Thereafter, the polysilicon layer is subjected to patterningthrough photolithography, or the like, thereby forming the active layer210. Here, a second mask may be used for the photolithography process.Impurities are injected into the polysilicon layer constituting theactive layer 210 so that the source region, the drain region, and thechannel CH may be formed.

Referring to FIGS. 10 and 11 , the gate insulating layer 130 may beformed on the active layer 210. The gate insulating layer 130 may beformed through a chemical vapor deposition process, a spin coatingprocess, a plasma-enhanced chemical vapor deposition process, asputtering process, a vacuum deposition process, a high-densityplasma-chemical vapor deposition process, a printing process, or thelike.

The first conductive layer may be formed on the gate insulating layer130. For example, the gate electrode 220 and the gate line GL connectedthereto may be formed on the gate insulating layer 130. The gateelectrode 220 may be formed in one pattern formed integrally with thegate line GL. In an embodiment, the gate line GL may be formed in ashape extending substantially along the row direction X.

The first conductive layer is formed by forming a conductive film on thegate insulating layer 130 using a printing process, a sputteringprocess, a chemical vapor deposition process, a pulse laser depositionprocess, a vacuum deposition process, an atomic layer depositionprocess, or the like, and by performing patterning through an etchingprocess using a mask. Here, a third mask may be used.

Referring to FIGS. 12 and 13 , the interlayer-insulating layer 140 maybe formed to cover the first conductive layer. First contact holes H1for contacting the second conductive layer and the underlying layer maybe formed in the interlayer-insulating layer 140. Specifically, theinterlayer-insulating layer 140 is formed on the entire surface of thesubstrate 100, and a mask process is performed to expose upwardly oneregion of the active layer 210 corresponding to the region of the firstcontact hole H1. A fourth mask may be used in the process of forming thefirst contact hole H1.

Referring to FIGS. 14 and 15 , the second conductive layer may be formedon the interlayer-insulating layer 140. For example, the sourceelectrode 230 and the drain electrode 240 and the data line DL connectedto at least one of them may be formed on the interlayer-insulating layer140. In an embodiment, the source electrode 230 may be formed in onepattern formed integrally with the data line DL. In an embodiment, thedata line DL may be formed to extend substantially along the columndirection Y.

In an embodiment, the touch sensing line SL may be further formed on theinterlayer-insulating layer 140. The touch sensing line SL may be formedto be spaced apart from the data line DL and extend substantially alongthe column direction Y.

The second conductive layer is formed by forming a conductive film onthe interlayer-insulating layer 140 using a printing process, asputtering process, a chemical vapor deposition process, a pulse laserdeposition process, a vacuum deposition process, an atomic layerdeposition process, or the like, and by performing patterning through anetching process using a mask. Here, a fifth mask may be used.

Referring to FIGS. 16 and 17 , the first passivation layer 150 may beformed on the second conductive layer. Also, the pixel electrode 310 maybe formed on the first passivation layer 150. The pixel electrode 310 ispatterned through an etching process using a mask so as to be formed tocorrespond to the opening area OA. Here, a sixth mask may be used.

Referring to FIGS. 18 and 19 , the second passivation layer 160 may beformed on the pixel electrode 310. Thereafter, contact holes H2 and H3for contacting with the pixel electrode 310 and the underlying layer,for example, with the drain electrode 240 may be formed. For example,the second contact hole H2 is formed to penetrate the second passivationlayer 160 and may connect the pixel electrode 310 and an island patternof the common electrode 320 to be formed later, and the third contacthole H3 is formed to penetrate the second passivation layer 160 and thefirst passivation layer 150, and may connect the drain electrode 240 andthe island pattern 324 of the common electrode 320.

Also, a contact hole H4 for connecting the touch sensing line SL and thecommon electrode 320 may be further formed. For example, the fourthcontact hole H4 is formed to penetrate the first and second passivationlayers 150 and 160, and thus may connect the common electrode 320 andthe touch sensing line SL (FIG. 5 ). These contact holes H2, H3, and H4may be formed through a mask process, and here, a seventh mask may beused.

Referring to FIGS. 20 and 21 , the common electrode 320 is formed on thesecond passivation layer 160. The common electrode 320 is formed toinclude the branch portions 321 arranged side by side at the equalintervals and the stem portion 322 connecting the branch portions 321.The branch portions 321 extend substantially in the row direction Xwithin the opening area OA, and the stem portions 322 are formed toextend in the column direction Y while connecting the branch portions321 to each other at both ends of the branch portions 321. The commonelectrode 320 may be formed by performing a mask process to have a shapecorresponding thereto. In this case, an eighth mask may be used.

A portion of the common electrode 320 may be formed as an island pattern324 overlapping the second and third contact holes H2 and H3. The islandpattern 324 may have various shapes, such as a circle, an ellipse, and apolygon. The island pattern may be connected to the pixel electrode 310and the drain electrode 240 through the second and third contact holesH2 and H3, and thus may electrically connect them.

In the display device 1 according to the present embodiment, the stackedstructure of the lower substrate 100 is manufactured through the eightmask processes as described above. In another embodiment, in theembodiment in which the touch sensing line SL is formed on a separateupper conductive layer or the dummy line is required, the number ofrequired mask processes is further increased. In addition, when the bumppattern is additionally formed, the number of required mask processesmay increase up to eleven.

However, in the present embodiment, since the lower substrate 100 can bemanufactured through eight mask processes, the manufacturing process canbe simplified and the manufacturing cost can be reduced.

FIG. 22 is an enlarged plan view of a region of a display deviceaccording to an embodiment. Specifically, FIG. 22 shows four adjacenttouch blocks TB1 to TB4.

The respective touch blocks TB1 to TB4 may correspond to a plurality ofpixels. The common electrodes 320 of pixels included in each of thetouch blocks TB1 to TB4 may be connected to each other and serve as onetouch sensing electrode TE (refer to FIG. 2 ). At the boundary betweenthe different touch blocks TB1 to TB4, the common electrodes 320 are notconnected to each other and are separated.

As described with reference to FIGS. 3 and 5 , these touch sensingelectrodes TE may be connected to the touch sensing line SL through acontact hole to transmit a touch scan signal. As illustrated, the touchsensing line SL is not disposed at the boundary between the touch blocksTB1 to TB4, and a contact area for connecting the touch sensing line SLis not formed.

The display device and the manufacturing method of the same according toembodiments can ensure a transmittance required for a display panel andimprove a viewing angle thereof.

In addition, the display device and the manufacturing method of the sameaccording to embodiments, can reduce the number of masks during amanufacturing process and reduce manufacturing costs, by omitting thecomponents.

Those of ordinary skill in the art to which the present disclosurepertains will appreciate that the present disclosure may be implementedin other specific forms without changing its technical spirit oressential features. Therefore, it should be understood that theembodiments described above are illustrative in all respects and notrestrictive. The scope of the present disclosure is indicated by thescope of the claims, which will be described later, rather than thedetailed description, and it will be appreciated that all the changed ormodified forms derived from the meaning and scope of the claims andtheir equivalent concepts are included in the scope of the presentdisclosure.

What is claimed is:
 1. A display device comprising: a pixel electrode inan opening area; a common electrode having at least one region thatoverlaps the pixel electrode in the opening area; a gate line extendingalong a row direction in a non-opening area, the non-opening areasurrounding the opening area; a data line extending along thenon-opening area in a column direction that is perpendicular to the rowdirection; and a touch sensing line extending in the column directionacross the opening area. wherein the opening area has a shape in which alength of the opening area in the row direction is longer than a lengthof the opening area in the column direction.
 2. The display device ofclaim 1, wherein the touch sensing line is on a same layer as the dataline and is non-overlapping with the data line.
 3. The display device ofclaim 1, wherein the pixel electrode has a rectangular shape in which alength of the pixel electrode in the row direction is longer than alength of the pixel electrode in the column direction.
 4. The displaydevice of claim 1, wherein the common electrode includes: a plurality ofbranch portions that extend in the row direction in the opening area,the plurality of branch portions disposed in the column direction atequal intervals such that a distance between each pair of adjacentbranch portions from the plurality of branch portions is the same; and astem portion connecting together the plurality of branch portions, thestem portion extending in the column direction.
 5. The display device ofclaim 1, further including: a color filter in the opening area; and ablack matrix around the color filter and overlapping the touch sensingline.
 6. The display device of claim 1, further comprising: a substrateincluding the opening area and the non-opening area; a first conductivelayer on the substrate, the first conductive layer including the gateline; a second conductive layer on the first conductive layer, thesecond conductive layer including the data line and the touch sensingline; and a passivation layer on the second conductive layer, whereinthe pixel electrode is on the passivation layer, and the commonelectrode is on the pixel electrode.
 7. A manufacturing method of adisplay device, the manufacturing method comprising: forming a lightblocking layer on a substrate using a first mask, the substrateincluding an opening area and a non-opening area that surrounds theopening area; forming an active layer on the light blocking layer usinga second mask; forming a gate line that extends in a row direction inthe non-opening area using a third mask; forming aninterlayer-insulating layer that covers the gate line; forming a firstcontact hole that exposes one region of the active layer using a fourthmask; forming a data line that extends in a column direction that isperpendicular to the row direction in the non-opening area, and a touchsensing line that extends in the column direction across the openingarea using a fifth mask; and forming a pixel electrode in the openingarea using a sixth mask, wherein the opening area has a shape in which alength of the opening area in the row direction is longer than a lengthof the opening area in the column direction.
 8. The manufacturing methodof the display device of claim 7, wherein forming the gate line includesforming a gate electrode of a transistor that overlaps a channel regionof the active layer, and wherein forming the data line and the touchsensing line includes forming a drain electrode and a source electrodeof the transistor that overlap the first contact hole.
 9. Themanufacturing method of the display device of claim 8, furtherincluding: forming a passivation layer that covers the pixel electrode;forming a second contact hole exposing one region of the drain electrodeusing a seventh mask; and forming a common electrode having at least oneregion overlapping the pixel electrode using an eighth mask, the commonelectrode connected to the drain electrode through the second contacthole.
 10. The manufacturing method of the display device of claim 9,wherein the data line and the touch sensing line are formed on a samelayer and are non-overlapping with each other.
 11. The manufacturingmethod of the display device of claim 9, wherein the pixel electrode hasa rectangular shape in which a length of the pixel electrode in the rowdirection is longer than a length of the pixel electrode in the columndirection.
 12. The manufacturing method of the display device of claim9, wherein the common electrode is formed by patterning to include: aplurality of branch portions that extend in the row direction in theopening area, the plurality of branch portions disposed in the columndirection at equal intervals such that a distance between each pair ofadjacent branch portions from the plurality of branch portions is thesame; and a stem portion connecting together the plurality of branchportions, the stem portion extending in the column direction.
 13. Themanufacturing method of the display device of claim 9, further includingforming a color filter in the opening area; and forming a black matrixaround the color filter and overlapping the touch sensing line.
 14. Adisplay device comprising: a plurality of pixels including a pixelhaving an opening area in which an image is displayed and a non-openingarea where the image is not displayed, the opening area having a lengthin a first direction that is longer than a length of the opening area ina second direction that is different from the first direction; aplurality of gate lines connected to the plurality of pixels, theplurality of gate lines including a gate line that extends in the firstdirection in the non-opening area of the pixel; a plurality of datalines connected to the plurality of pixels, the plurality of data linesincluding a data line that extends in the second direction in thenon-opening area of the pixel; a plurality of touch sensing linesincluding a touch sensing line that extends in the second directionacross the opening area of the pixel; wherein the pixel includes a pixelelectrode in the opening area of the pixel and a common electrode havinga portion that overlaps the pixel electrode in the opening area, theportion of the common electrode having a length in the first directionthat is longer than a length of the portion of the common electrode inthe second direction.
 15. The display device of claim 14, wherein theportion of the common electrode in the opening area comprises aplurality of protrusions that extend in the first direction in theopening area, the plurality of protrusions disposed in the seconddirection at equal intervals such that a distance between each pair ofadj acent protrusions from the plurality of protrusions is the same. 16.The display device of claim 14, wherein the common electrode furthercomprises a connecting portion that extends in the second direction inthe non-opening area, the connecting portion connecting together theplurality of protrusions.
 17. The display device of claim 14, whereinthe pixel electrode has a rectangular shape in which a length of thepixel electrode in the first direction is longer than a length of thepixel electrode in the second direction.
 18. The display device of claim14, further comprising: a substrate; a first conductive layer on thesubstrate, the first conductive layer including the gate line; a secondconductive layer on the first conductive layer, the second conductivelayer including the data line and the touch sensing line; and apassivation layer on the second conductive layer, wherein the pixelelectrode is on the passivation layer, and the common electrode is onthe pixel electrode.
 19. The display device of claim 14, wherein thetouch sensing line is on a same layer as the data line and isnon-overlapping with the data line.
 20. The display device of claim 1,further including: a color filter in the opening area; and a blackmatrix around the color filter and overlapping the touch sensing line.